| Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process | |
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| 년도 | 2021 |
| 날짜 | 2021 May 5 |
| 페이지 / 학회지명 |
409:123759 / Journal of Hazardous Materials |
| 논문저자 | Tae-Kyoung Kim 1, Taeyeon Kim 2, Inae Lee 2, Kyungho Choi 2, Kyung-Duk Zoh 3 |
| Link |
https://www.sciencedirect.com/science/article/abs/pii/S030438942031748…
109회 연결
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1 Department of Environmental Health Sciences, School of Public Health, Seoul National University, Seoul, Republic of Korea; Environmental Fate and Exposure Research Group, Korea Institute of Toxicology, Jinju, Republic of Korea. 2 Department of Environmental Health Sciences, School of Public Health, Seoul National University, Seoul, Republic of Korea. 3 Department of Environmental Health Sciences, School of Public Health, Seoul National University, Seoul, Republic of Korea. Electronic address: zohkd@snu.ac.kr. Abstract In this study, we used a nano-ozone bubble to enhance the efficiency of the ozone/H2O2 process for the degradation of tetramethylammonium hydroxide (TMAH) found in semiconductor wastewater at high levels. The nano-ozone bubble significantly increased ozone mass transfer rate compared to that of the macro-ozone bubble. The half-life of nano-ozone bubbles was 23 times longer than that of the nano-ozone bubbles. Due to the high ozone mass transfer rate and its durability, the nano-ozone bubble increased the TMAH degradation rate compared to that of the macro-ozone. The addition of H2O2 significantly increased the TMAH degradation rate constant by OH production during the nano-ozone bubbles/H2O2 process. The optimum conditions for TMAH removal was 25 °C and pH 10. Within 90 min of the nano-ozone/H2O2 process, TOC removal was 65 % while 80 % of nitrogen was converted into nitrate (NO3-) with 95 % of TMAM removal. Decreases in acute (40-fold) and chronic (2-fold) toxicity were achieved after applying the nano-ozone/H2O2 process to TMAH containing wastewater. However, there was no significant chronic toxicity decrease during the nano-ozone/H2O2 process of TMAH. Keywords: Nano-ozone; Peroxone; Semiconductor wastewater; TMAH; Toxicity. |
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